Researchers on the U.S. Division of Vitality’s Princeton Plasma Physics Laboratory (PPPL) have developed a brand new theoretical mannequin explaining one option to make black silicon, an vital materials utilized in photo voltaic cells, gentle sensors, antibacterial surfaces and plenty of different functions.
Black silicon is made when the floor of standard silicon is etched to provide tiny nanoscale pits on the floor. These pits change the colour of the silicon from grey to black and, critically, entice extra gentle, a vital characteristic of environment friendly photo voltaic cells.
Whereas there are various methods to make black silicon, together with some that use the charged, fourth state of matter referred to as plasma, the brand new mannequin focuses on a course of that makes use of solely fluorine gasoline. PPPL Postdoctoral Analysis Affiliate Yuri Barsukov mentioned the selection to deal with fluorine was intentional: The staff at PPPL needed to fill a spot in publicly out there analysis. Whereas some papers have been printed in regards to the function of charged particles referred to as ions within the manufacturing of black silicon, not a lot has been printed in regards to the function of impartial substances, akin to fluorine gasoline.
“We now know—with nice specificity—the mechanisms that trigger these pits to kind when fluorine gasoline is used,” mentioned Barsukov, one of many authors of a new paper in regards to the work, showing within the Journal of Vacuum Science & Know-how A.
“This type of data, printed publicly and brazenly out there, advantages us all, whether or not we pursue additional data into the primary data that underlines such processes or we search to enhance manufacturing processes,” Barsukov added.
Mannequin reveals bonds break primarily based on atom orientation on the floor
The brand new etching mannequin exactly explains how fluorine gasoline breaks sure bonds within the silicon extra usually than others, relying on the orientation of the bond on the floor. As silicon is a crystalline materials, atoms bond in a inflexible sample. These bonds will be characterised primarily based on the best way they’re oriented within the sample, with every kind of orientation, or airplane, recognized by a bracketed quantity, akin to [100], [110] or [111].
“When you etch silicon utilizing fluorine gasoline, the etching proceeds alongside [100] and [110] crystal planes however doesn’t etch [111], leading to a tough floor after the etching,” defined Barsukov. Because the gasoline etches away on the silicon inconsistently, pits are created on the floor of the silicon. The rougher the floor, the extra gentle it may possibly soak up, making tough black silicon very best for photo voltaic cells. Clean silicon, in distinction, is a perfect floor for creating the atomic-scale patterns mandatory for pc chips.
“If you wish to etch silicon whereas leaving a easy floor, it is best to use one other reactant than fluorine. It needs to be a reactant that etches uniformly all crystalline planes,” Barsukov mentioned.
PPPL expands its experience into quantum chemistry
The analysis can be notable as a result of it represents an early success in one in every of PPPL’s latest analysis areas.
“The Lab is diversifying,” mentioned Igor Kaganovich, principal analysis physicist and co-author of the paper. “This can be a first for PPPL, to do this type of quantum chemistry work.”
Quantum chemistry is a department of science investigating the construction and reactivity of molecules utilizing quantum mechanics, the legal guidelines of physics governing very small and really gentle objects, akin to electrons and nuclei.
Different researchers who contributed to the paper embrace Joseph Vella, affiliate analysis physicist; Sierra Jubin, a graduate scholar at Princeton College; and former analysis assistant at PPPL Omesh Dhar Dwivedi.
Extra data:
Omesh Dhar Dwivedi et al, Orientation-dependent etching of silicon by fluorine molecules: A quantum chemistry computational research, Journal of Vacuum Science & Know-how A (2023). DOI: 10.1116/6.0002841
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Princeton Plasma Physics Laboratory
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