Silicene or two-dimensional (2D) graphene-like silicon allotrope has lately emerged as a promising candidate for varied purposes in nanotechnology. Nonetheless, few considerations involving its stability persist up to now and should be addressed to construct units which might be compliant and aggressive. Right here, we current an all-around encapsulation methodology past the present state-of-the-art for silicene, usually sandwiched in between a capping layer (e.g., Al2O3) and the supporting substrate (e.g., Ag). On this framework, the insertion of 1 or two sacrificial 2D Sn layers permits the conclusion of various atomically skinny encapsulation schemes, preserving the pristine properties of silicene whereas decoupling it from the expansion template. On the one hand, the insertion of a 2D Sn layer on the backside of silicene permits to take away the Ag substrate, stabilizing silicene which will be simply gated, for instance, through the on the highest oxide. Then again, a full 2D encapsulation scheme, the place prime and backside faces of silicene are protected by 2D Sn layers, offers rise to an atomically skinny and cm2-scaled membrane stopping degradation of silicene for months. Each schemes thus represent an development for the silicene stability and encapsulation in ambient situations, paving the way in which to additional exploitation in versatile electronics and photonics.
